Product data
Cluster Plasma Etch/Deposition System
brief introduction：

Trion manufactures a variety of plasma etch and deposition systems for the Compound Semiconductor, MEMS, Opto-Electronic and other markets. Our products feature the smallest footprint and lowest cost systems in the industry with proven production reliability.
Product details
Oracle III Cluster Plasma Etch/Deposition System

The Oracle III is the smallest full production cluster system on the market. It consists of a central vacuum transport (CVT), vacuum cassette elevators and up to four process reactors. These process reactors are docked to the central loadlock and run in production-mode or can be operated independently as stand-alone systems. The Oracle III can be configured for either the laboratory environment (single wafer loading) or for full production (vacuum cassette elevators) making it the most flexible system on the market. Because the Oracle III accommodates up to four separate process chambers, there are many possible process combinations, including RIE/ICP etch and PECVD deposition. Multiple chambers can be run at the same time. Processes are safely run without atmospheric contamination since all chambers are vacuum loadlocked.

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