Thermco’s Model 5100 and 5200 Diffusion Furnace are four-process chamber systems used for processing Semiconductor, PV , LED,Nano and MEMS substrates up to 150 mm in diameter. The only difference between the two models is the length of available flatzone, with the 5200 series having greater wafer processing capacity. Each chamber can accommodate process tubes up to 10 inches (251 mm) in diameter.