Product data
Fully automated plasma system
brief introduction：

Trion manufactures a variety of plasma etch and deposition systems for the Compound Semiconductor, MEMS, Opto-Electronic and other markets. Our products feature the smallest footprint and lowest cost systems in the industry with proven production reliability.

Product details

Titan

The Titan is a very compact, fully automated, vacuum loadlocked plasma system for semiconductor production.
The Titan is available in either Reactive Ion Etch (RIE) configuration, High Density Inductive Coupled Plasma (HDICP) or Plasma Enhanced Chemical Vapor Deposition (PECVD) configuration. Used for advanced processing of single wafers or mounted parts (3” - 300mm). It also has multiple size batch capability. Small footprint at an affordable price.
Etch applications:
Gallium arsenide, aluminum gallium arsenide, gallium nitride, indium phosphide, aluminum, silicides, chrome and other materials requiring both corrosive and non-corrosive chemistries. 

Deposition applications:
Silicon dioxide, silicon nitride, oxynitride, and various other materials.

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